Manufacturing method for electroluminescent thin film

Coating processes – Electrical product produced – Fluorescent or phosphorescent base coating

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427 69, 4272481, 4272552, B05D 506, C23C 1600

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active

052758400

ABSTRACT:
In a manufacturing method for an electroluminescent thin film, a base material made of a II-VI group compound semiconductor and a material of an element for an emission center to be included in the base material are provided separately in first and second gas passages provided in a source zone on the upstream side of a reaction tube. The base material is transported to a growth zone on the downstream side thereof through the first gas passage by the use of an inert carrier gas, while the element material is transported through the second gas passage in the form of a halogen compound vapor, so as to grow an electroluminescent thin film on a substrate disposed in the growth zone. A reducing gas is fed to the growth zone through a third gas passage which bypasses the source zone from the upstream side to the downstream side of the reaction tube.

REFERENCES:
Akiyoshi Mikami et al.; "Chemical Vapor Deposition of a ZnS:Mn Electroluminescent Film in a Low-Pressure Halogen Transport System", Jan. 19, 1990 pp. 61-68.

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