Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified radiation sensitive composition with color...
Patent
1984-04-06
1985-11-05
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified radiation sensitive composition with color...
430203, 430223, 430224, 430542, G03C 140, G03C 554
Patent
active
045514232
ABSTRACT:
A photographic light-sensitive material comprising a support having provided thereon at least one light-sensitive silver halide emulsion layer in combination with an immobile LDA compound represented by the following general formula (I): ##STR1## wherein n, x, y and z each stands for an integer of 1 or 2; m stands for an integer of 1 or more; D stands for a group containing an electron donor or its precursor moiety; A stands for an organic group linking Nup to --E--Q--Col or D; Nup stands for a precursor of a nucleophilic group; E stands for an electrophilic center; Q is a divalent group; Col stands for a group containing a dye or its precursor moiety; Ball stands for a ballast group; L stands for a linking group; and M stands for an optional substituent, said LDA compound being capable of releasing a diffusible dye or its precursor upon redox reaction.
REFERENCES:
patent: 4139379 (1979-02-01), Chasman et al.
patent: 4139389 (1979-02-01), Hinshaw et al.
patent: 4199355 (1980-04-01), Hinshaw et al.
patent: 4263393 (1981-04-01), Chen
patent: 4381339 (1983-04-01), Renner et al.
Koyama Koichi
Noguchi Yasuhiro
Toriuchi Masaharu
Fuji Photo Film Co. , Ltd.
Schilling Richard L.
LandOfFree
Photographic light-sensitive material with nucleophilic displace does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photographic light-sensitive material with nucleophilic displace, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photographic light-sensitive material with nucleophilic displace will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-295929