Photocopying – Projection printing and copying cameras – Detailed holder for original
Reexamination Certificate
2001-03-05
2002-04-02
Adams, Russell (Department: 2851)
Photocopying
Projection printing and copying cameras
Detailed holder for original
C355S053000, C355S072000, C355S077000, C430S311000, C430S312000, C250S492200
Reexamination Certificate
active
06366342
ABSTRACT:
INCORPORATION BY REFERENCE
The disclosure of the following priority application is herein incorporated by reference in its entirety: Japanese Patent Application No. 2000-078022 filed Mar. 21, 2000.
BACKGROUND OF THE INVENTION
1. Field of Invention
The invention relates to a drive apparatus, an exposure apparatus, and to a manufacturing method using the same. In particular, the invention relates to a drive apparatus that drives an object within a two dimensional plane including a first axis and a second axis orthogonal to the first axis, and to an exposure apparatus in which the drive apparatus serves as a mask drive apparatus, and to device manufacturing methods using the same.
2. Description of Related Art
In a lithography process for manufacturing semiconductor devices, liquid crystal display elements, and the like, stationary type exposure apparatus such as the conventional step-and-repeat reduction projection exposure apparatus (a so-called “stepper”) have been used. In recent years, along with the advent of highly integrated semiconductor devices and the increased size of wafer substrates and masks or reticles (hereinafter called a “reticle”), scanning exposure apparatus such as stepand-scan type exposure apparatus (a so-called “scanning stepper”), which successively transfers a reticle pattern to a substrate via a projection optical system while moving a reticle and a substrate along a predetermined scanning direction in a synchronous manner are becoming mainstream. These scanning exposure apparatus are capable of exposure of a larger field while using a smaller projection optical system compared to a stepper. As a result, there are advantages in that the manufacture of the projection optical system is less complicated, a high throughput can be achieved, along with an averaging effect due to relative scanning of the substrate and the reticle for a projection optical system, and improved focus depth and distortion.
However, a scanning exposure apparatus requires a drive apparatus for driving a reticle on the reticle side (of the projection optical system) in addition to a stage apparatus on the substrate side for driving a substrate. Scanning exposure apparatus in recent years have used a macromotion and micromotion mechanism in a reticle stage apparatus having a reticle macromotion stage that is moved in a predetermined stroke range in the scanning direction by a pair of linear motors placed on both sides of the stage relative to the non-scanning direction, which is orthogonal to the scanning direction, and that is float supported by air bearings, and the like on a reticle platform. This macromotion stage serves as a drive apparatus on the reticle side. In addition, a reticle micromotion stage is provided, which is slightly driven by voice coil motors, and the like in the scanning direction, the non-scanning direction and the yawing direction.
However, with the conventional drive apparatus on the reticle side mentioned above, the stage apparatus necessarily becomes large due to the linear motors being disposed on both sides of the reticle macromotion stage for driving the reticle macromotion stage in the scanning direction. Also, with this drive apparatus, it is necessary to exchange the reticle (i.e., when a reticle having a different pattern is needed) from a predetermined side relative to the scanning direction (i.e., the side without a laser interferometer for measuring the scan direction position of the reticle micromotion stage (and reticle macromotion stage)), or to move the reticle loader from one side relative to the non-scanning direction, straddle the linear motor stationary member, move onto the reticle stage, and change the reticle.
In the case of the former, it is difficult to obtain a degree of freedom of placement for a reticle loader and a laser interferometer, and, in the case of the latter, up and down movement equal to or greater than the predetermined stroke of at least the reticle loader or the reticle is necessary, and the reticle change sequence necessarily becomes complicated.
Also, because a pair of linear motors for driving in the scanning direction is necessary, the entire drive apparatus becomes larger and heavier.
The application of a drive apparatus capable of moving a stage in a predetermined long stroke direction (i.e., the scanning direction) with an object placed on it, and capable of micromotion in the rotation direction and the direction orthogonal to the long stroke direction is not limited to exposure apparatus, but may also be applied as a sample positioning apparatus in other high precision machines, and the like. It is preferable that such positioning apparatus also be small and light weight.
SUMMARY OF THE INVENTION
The invention was conceived in consideration of such problems, and one object of the invention is to provide a small, yet light weight drive apparatus capable of driving an object in a predetermined direction and capable of micromotion in the rotation direction and in the direction orthogonal to the predetermined direction.
Another object of the invention is to provide an exposure apparatus capable of high precision exposure, and capable of obtaining a degree of freedom of placement for each member that is provided in the vicinity of the mask.
A further object of the invention is to provide a highly integrated device having a detailed pattern with excellent precision, and a manufacturing method of the same.
One aspect of the invention relates to a drive apparatus for driving an object within a two-dimensional plane including a first axis and a second axis orthogonal to the first axis. The drive apparatus includes a first stage on which the object is placed. In addition, a micromotion mechanism slightly drives the first stage in the second axis direction and in the rotation direction about a third axis that is orthogonal to the two-dimensional plane. A second stage holds the first stage in a non-contact manner. A non-contact holding mechanism disposed between the first stage and the second stage holds the first stage to the second stage in a non-contact manner which allows for micromotion of the first stage in the second axis direction and in the rotation direction relative to the second stage. A macromotion mechanism drives the second stage in the first axis direction. The second stage, the non-contact holding mechanism, the micromotion mechanism, and the macromotion mechanism are all placed on one side of the first stage, displaced from the third axis.
Accordingly, a non-contact holding device is disposed between the first stage on which an object is placed and the second stage, and the first stage is held to the second stage in a non-contact manner allowing micromotion of the first stage in the second axis direction and in the rotation direction relative to the second stage. Also, the macromotion mechanism drives the second stage with the first stage in the first axis direction. In addition, the micromotion mechanism slightly drives the first stage in the rotation direction (yawing direction) about the third axis orthogonal to the two-dimensional plane and in the second axis direction. Accordingly, it is possible to adjust the position of an object placed on the first stage with excellent precision in the direction of the second axis and in the yawing direction.
Also, the second stage, the non-contact holding mechanism, the micromotion mechanism, and the macromotion mechanism are all arranged on one side of the first stage on which the object is placed. In other words, the first stage is so-called cantilever supported by the second stage, non-contact holding mechanism, micromotion mechanism, macromotion mechanism, and the like. Therefore, on the other side of the first stage there is no drive system, and thus sufficient space is obtainable. It is sufficient to equip the drive apparatus with at least one macromotion mechanism, a linear motor and the like for stage driving for example, on one side of the first stage.
Therefore, it is possible to drive an object in a predetermined direction (first axis direction), sl
Adams Russell
Brown Khaled
Nikon Corporation
Oliff & Berridg,e PLC
LandOfFree
Drive apparatus, exposure apparatus, and method of using the... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Drive apparatus, exposure apparatus, and method of using the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Drive apparatus, exposure apparatus, and method of using the... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2918253