Method for fabricating locally reinforced metallic microfeature

Details Method for fabricating locally reinforced metallic microfeature Method for fabricating locally reinforced metallic microfeature

1999-11-24

2002-03-26

Chaudhuri, Olik (Department: 2814)

Semiconductor device manufacturing: process

Forming schottky junction

C438S511000, C438S597000, C438S618000, C438S622000, C438S623000, C438S625000, C438S637000, C438S538000, C438S639000, C438S640000, C438S652000, C438S975000

Reexamination Certificate

active

06362083

ABSTRACT:

FIELD OF THE INVENTION
The present invention relates to a method for fabricating a locally reinforced metallic microfeature, in particular of micro-reflectors. The microfeature, for example of a reflector plate and/or of a recess (cut-out), is locally strengthened in order to avoid deformations in the reflector plate, and to achieve the necessary stability for the recesses in order to suspend the tilting-type elements.
BACKGROUND INFORMATION
A method using an organic photo-sensitive resist layer in the micrometer range for fabricating micro-reflectors having locally thicker layers is described in the publication “Texas Instruments Digital Light Processing and MEMS: Timely Convergence for a Bright Future,” L. J. Hornbeck, Micromachining and Microfabrication
95
, Plenary Session Paper, Texas, U.S., 1995. This conventional method uses a complicated and cost-intensive process for masking the reflector surface with a silicon dioxide mask and subsequently subjecting the aluminum layers to a plasma etching.
SUMMARY
The photolithography employed in the method of the present invention, with subsequent wet-chemical etching of the metal layers, is less complicated and more cost-effective from a technological standpoint. To fabricate the patterned sacrificial layer and the photo-sensitive resist layers required by the method, both positive as well as negative photo-sensitive resists can be used. When working with the positive photo-sensitive resist, the exposed regions are removed following irradiation and development.
Exemplary embodiments for fabricating locally reinforced features in the form of micro-reflectors in micro-reflector arrays, where the recesses (posts and hollow posts) supporting the micro-reflectors, support two contiguous micro-reflectors, are depicted in the drawings and elucidated in the following description.


REFERENCES:
patent: 5567334 (1996-10-01), Baker et al.
patent: 5638946 (1997-06-01), Zavracky
patent: 6171945 (2001-01-01), Mandal et al.
“Texas Instruments Digital Light Processing and MEMS: Timely Convergence for a Bright Future,” L.J. Hornbeck, Micromachining and Microfabrication 95, Plenary Session Paper, Texas, U.S., 1995.

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