Exposure mask blank manufacturing method and exposure mask...

Details Exposure mask blank manufacturing method and exposure mask... Exposure mask blank manufacturing method and exposure mask...

2008-06-10

2008-06-10

Huff, Mark F. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S004000

Reexamination Certificate

active

07384713

ABSTRACT:
A method of manufacturing an exposure mask blank including a substrate and a light-shielding film formed on the substrate, comprising measuring a first flatness of each of a plurality of substrates before formation of a light-shielding film, predicting, on the basis of the first flatness, a second flatness of each substrate when chucked on an exposure apparatus, selecting from the plurality of substrates, at least one substrate having a predetermined flatness on the basis of the second flatness, predicting a desired third flatness of the at least one substrate after a light-shielding film is formed on the substrate, forming a light-shielding film on the selected at least one substrate, measuring a fourth flatness of the at least one substrate having the formed light-shielding film, and determining whether the at least one substrate having the light-shielding film has the desired third flatness by comparing the fourth flatness with the third flatness.

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Official Action from the German Patent and Trademark Office, dated Mar. 14, 2007, in counterpart German Patent Application No. 10 2004 026 206.3-51.
Official Action from the German Patent and Trademark Office, dated Mar. 14, 2007, in counterpart German Patent Application No. 10 2004 026 206.3-51.

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