Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Including dielectric isolation means

Reexamination Certificate

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Details

Other Related Categories

C257S347000, C257S547000, C257SE29020, C257S501000, C257SE27112, C257SE29018

Type

Reexamination Certificate

Status

active

Patent number

07391095

Description

ABSTRACT:
In a PMOS transistor, the source-drain region is divided into four parts along the gate width and has an arrangement of four independent source regions and an arrangement of four independent drain regions. A partial trench isolation insulating film is arranged in contact with the whole of the opposed surfaces between the four source regions in such a manner that the channel region formed under the gate electrode is divided across the channel length. A body-tied region containing N-type impurities relatively high in concentration is arranged in contact with the side surface of the source region opposite to the gate electrode, and the potential of the body region is fixed through the well region from the body-tied region.

REFERENCES:
patent: 6624021 (2003-09-01), Noble
patent: 6858504 (2005-02-01), Noble
patent: 7190050 (2007-03-01), King et al.
patent: 7247887 (2007-07-01), King et al.
patent: 7265008 (2007-09-01), King et al.
patent: 2004/0238919 (2004-12-01), Brintzinger et al.
Yuuichi Hirano, et al., “Bulk-Layout-Compatible 0.18-μm SOI-CMOS Technology Using Body-Tied Partial—Trench-Isolation (PTI)”, IEEE Transactions on Electron Devices, vol. 48, No. 12, Dec. 2001, pp. 2816-2822.
Kerry Bernstein, et al., “SOI Circuit Design Concepts”, Kluwer Academic Publishers, cover page and pp. 22-23.

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