Method of manufacturing a semiconductor device including a...

Details Method of manufacturing a semiconductor device including a... Method of manufacturing a semiconductor device including a...

2008-06-24

2008-06-24

Huynh, Andy (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

C257S079000, C372S046014, C385S131000

Reexamination Certificate

active

07390683

ABSTRACT:
A semiconductor device has a two-dimensional slab photonic crystal structure in which a substrate supports a sheet-like slab layer including, sequentially stacked, a lower cladding layer, an active layer, and an upper cladding layer. A periodic refractive index profile structure, in surfaces of the stacked layers, introduces a linear defect region that serves as a waveguide. A p-type region and an n-type region in the slab layer define a pn junction surface at a predetermined angle with respect to the surfaces of the stacked layers in the slab layer.

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Sugitatsu et al. “Room Temperature Lasing Oscillation Of A Two Dimensional Photonic Crystal Slab With Defect Waveguide By Optical Pump.” 2002 IEICE Electronics Society Conference, pp. 329-330.

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