Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2008-03-25
2008-03-25
Schillinger, Laura M. (Department: 2813)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S158000, C438S151000
Reexamination Certificate
active
07348196
ABSTRACT:
A liquid crystal display includes a plurality of gate lines (GØ-Gn), a plurality of data lines (D1-Dn) formed in a direction crossing the gate lines, a plurality of pixel electrodes formed in a pixel area defined by the gate lines and the data lines, the pixel electrodes indicating pictures by a control of the corresponding gate lines, and a light volume adjusting layer formed on a lower layer of the pixel electrodes controlled by a second one of the gate lines (G1). A method for manufacturing a liquid crystal display includes the steps of: forming gate lines and a gate electrode on a substrate, forming a gate insulating film on the board including the gate electrode, forming a first active layer on the gate insulating film corresponding to an upper portion of the gate electrode and forming a second active layer on the gate insulating film corresponding to a portion where pixel electrodes are formed, forming source/drain electrodes on an upper portion of the first active layer, and forming a passivation film on the whole surface of the active layer including the source/drain electrodes.
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LG.Philips LCD Co. , Ltd.
McKenna Long & Aldridge LLP
Schillinger Laura M.
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