Defect inspection apparatus and defect inspection method

Details Defect inspection apparatus and defect inspection method Defect inspection apparatus and defect inspection method

2008-04-08

2008-04-08

Nguyen, Tu T (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

Reexamination Certificate

active

07355691

ABSTRACT:
An irregularity defect inspection apparatus for inspecting an object to be inspected having a repeated pattern composed of regularly arranged unit patterns on the surface thereon to detect an irregularity defect occurring in the repeated pattern. The apparatus includes a light source apparatus having a light source for applying light to a region including an inspection region of the object to be inspected at a desired incidence angle, and an observation apparatus having a light-receiving optical system for receiving light which is generated from the inspection surface of the object to be inspected perpendicularly thereto when light is applied by the light source apparatus. The light source apparatus is provide with a light source having a parallelism of 2 degrees or less and an illuminance of 300000 Lx or higher.

REFERENCES:
patent: 5838433 (1998-11-01), Hagiwara
patent: 2004/0081917 (2004-04-01), Tanaka et al.
patent: 9-329555 (1997-12-01), None

Affiliated with

Also associated with

Rating

Defect inspection apparatus and defect inspection method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Defect inspection apparatus and defect inspection method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Defect inspection apparatus and defect inspection method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2785382