Chemical vapor deposition apparatus

Coating apparatus – Gas or vapor deposition – Work support

Reexamination Certificate

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Details

C156S345550

Reexamination Certificate

active

07368018

ABSTRACT:
A chemical vapor deposition apparatus is provided. The chemical vapor deposition apparatus includes a susceptor support base and a susceptor, and configured to rotate the susceptor with a rotary shaft, a gap as wide as about 1 mm or more is provided along the boundary between the support base and the perimeter of the susceptor to prevent Ga from forming bridges between the support base and the susceptor during growth of III-V compound semiconductors such as GaN, thereby preventing disturbance of rotation.

REFERENCES:
patent: 3707868 (1973-01-01), Fruit
patent: 5685039 (1997-11-01), Hamada et al.
patent: 5782979 (1998-07-01), Kaneno et al.
patent: 5788777 (1998-08-01), Burk, Jr.
patent: 6449428 (2002-09-01), Aschner et al.
patent: 6569250 (2003-05-01), Paisley et al.
patent: 6733591 (2004-05-01), Anderson
patent: 2001/0047762 (2001-12-01), Hayashi
patent: 2002/0083899 (2002-07-01), Komeno et al.
patent: 02-288665 (1990-11-01), None
patent: 04-094719 (1992-03-01), None
patent: 08213329 (1996-08-01), None
patent: 11-012085 (1999-01-01), None
patent: 11-067670 (1999-03-01), None
patent: 2000-012470 (2000-01-01), None
patent: 2002-175992 (2002-06-01), None
patent: WO 2000/36635 (2000-06-01), None

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