Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2008-01-01
2008-01-01
Webb, Gregory (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C134S001300
Reexamination Certificate
active
07314853
ABSTRACT:
Disclosed herein are photoresist cleaning solutions useful for cleaning a semiconductor substrate in the last step of a developing step when photoresist patterns are formed. Also disclosed herein are methods for forming photoresist patterns using the solutions. The cleaning solutions of the present invention include H2O as a primary component, a surfactant as an additive, and optionally an alcohol compound. The cleaning solution of the present invention has lower surface tension than that of distilled water which has been used for conventional cleaning solutions, thereby improving resistance to pattern collapse and stabilizing the photoresist pattern formation.
REFERENCES:
patent: 3515701 (1970-06-01), Tiers
patent: 3985810 (1976-10-01), von Halasz et al.
patent: 4914161 (1990-04-01), Muller et al.
patent: 4925917 (1990-05-01), Wife et al.
patent: 2004/0072108 (2004-04-01), Hyon
Ban Keun Do
Kim Sam Young
Lee Geun Su
Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
Webb Gregory
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