Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2008-04-01
2008-04-01
Pham, Hoa Q. (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237500
Reexamination Certificate
active
07352457
ABSTRACT:
Disclosed is an optical inspection system for inspecting the surface of a substrate. The optical inspection system includes a light source for emitting an incident light beam along an optical axis and a first set of optical elements arranged for separating the incident light beam into a plurality of light beams, directing the plurality of light beams to intersect with the surface of the substrate, and focusing the plurality of light beams to a plurality of scanning spots on the surface of the substrate. The inspection system further includes a light detector arrangement including individual light detectors that correspond to individual ones of a plurality of reflected or transmitted light beams caused by the intersection of the plurality of light beams with the surface of the substrate. The light detectors are arranged for sensing the light intensity of either the reflected or transmitted light.
REFERENCES:
patent: 4013367 (1977-03-01), Nagao et al.
patent: 4291990 (1981-09-01), Takasu
patent: 5076692 (1991-12-01), Neukermans et al.
patent: 5130965 (1992-07-01), Karaki et al.
patent: 5151888 (1992-09-01), Shikichi et al.
patent: 5268747 (1993-12-01), Schoeps
patent: 5506676 (1996-04-01), Hendler et al.
patent: 5563702 (1996-10-01), Emery et al.
patent: 5569929 (1996-10-01), Mizutani et al.
patent: 5576825 (1996-11-01), Nakajima et al.
patent: 5602400 (1997-02-01), Kawashima
patent: 5726740 (1998-03-01), Shiozawa et al.
patent: 5737072 (1998-04-01), Emery et al.
patent: 6043932 (2000-03-01), Kusunose
patent: 6084716 (2000-07-01), Sanada et al.
patent: 6195202 (2001-02-01), Kusunose
patent: 6208411 (2001-03-01), Vaez-Iravani
patent: 6636301 (2003-10-01), Kvamme et al.
patent: 6850321 (2005-02-01), Yu
patent: 6879390 (2005-04-01), Kvamme et al.
patent: 7075638 (2006-07-01), Kvamme et al.
patent: 2003/0086080 (2003-05-01), Guan et al.
patent: 2005/0134840 (2005-06-01), Yu
patent: 0831295 (1998-03-01), None
patent: 99/38002 (1999-07-01), None
Kvamme Damon F.
Walsh Robert W.
Beyer & Weaver, LLP
Kla-Tencor Corporation
Pham Hoa Q.
LandOfFree
Multiple beam inspection apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multiple beam inspection apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple beam inspection apparatus and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2769656