Mask blank transparent substrate manufacturing method, mask...

Details Mask blank transparent substrate manufacturing method, mask... Mask blank transparent substrate manufacturing method, mask...

Filed on

2011-03-08

Date issued

2011-03-08

Examiner

Rosasco, Stephen (Department: 1795)

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Radiation modifying product or process of making

SubSubClass

Radiation mask

Other Related Categories

C430S030000

Type

Reexamination Certificate

Status

active

Patent number

07901840

Description

ABSTRACT:
A method includes a preparation step of preparing a transparent substrate having a precision-polished main surface, a surface shape information obtaining step of obtaining, as surface shape information, height information at a plurality of measurement points on the main surface of the transparent substrate that contacts a mask stage of an exposure apparatus, a simulation step of obtaining, based on the surface shape information and shape information of the mask stage, height information at the plurality of measurement points by simulating the state where the transparent substrate is set in the exposure apparatus, a flatness calculation step of calculating, based on the height information obtained through the simulation, a flatness of the transparent substrate when it is set in the exposure apparatus, a judging step of judging whether or not the calculated flatness satisfies a specification, and a thin film forming step of forming a thin film as serving as a mask pattern, on the main surface of the transparent substrate whose flatness satisfies the specification.

REFERENCES:
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patent: 6740208 (2004-05-01), Kureishi et al.
patent: 2004/0192063 (2004-09-01), Koike
patent: 2005/0019678 (2005-01-01), Nakatsu et al.
patent: 2006/0223224 (2006-10-01), Akagawa
patent: 8-31723 (1996-02-01), None
patent: 2003050458 (2003-02-01), None
patent: 2003-81654 (2003-03-01), None
patent: 2003315980 (2003-11-01), None
patent: 2004-46259 (2004-02-01), None
patent: 2005043837 (2005-02-01), None
patent: 2004083961 (2004-09-01), None
Japanese Office Action corresponding to Japanese Patent Application No. 2005-050936, dated Aug. 18, 2010.

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