Stencil, stencil design system and method for cell...

Details Stencil, stencil design system and method for cell... Stencil, stencil design system and method for cell...

2011-03-29

2011-03-29

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S296000, C430S942000

Reexamination Certificate

active

07914954

ABSTRACT:
Stencil masks, particle beam lithography characters and methods for designing the same for use in particle beam lithography are disclosed. The masks, characters and methods for designing them allows for more accurately writing images by reducing various chemical and physical effects, particularly Coulomb and proximity effects. Particle current reaching a surface is reduced by introducing shield areas, which preserve the shape and fidelity of the written image. The shape of the written image is further corrected by systematically adjusting the shape of the character or mask.

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