Method and resulting structure for mosaic of...

Details Method and resulting structure for mosaic of... Method and resulting structure for mosaic of...

2011-03-29

2011-03-29

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07914950

ABSTRACT:
A reticle device. The device has a quartz substrate, which has a surface region. A first region comprising a plurality of binary mask patterns is formed on a first portion of the surface region. A second region comprising a plurality of first phase shift mask patterns is formed on a second portion of the surface region. A third region comprising a plurality of second phase shift mask patterns is formed on a third portion of the surface region. Accordingly, the reticle device has at least three different regions corresponding to different optical characteristics.

REFERENCES:
patent: 6994939 (2006-02-01), Ghandehari et al.
patent: 2002/0132173 (2002-09-01), Rolfson
patent: 2004/0197677 (2004-10-01), Kohle et al.
patent: 2005/0208390 (2005-09-01), Xiao

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