Methods to form wide heater trenches and to form memory...

Details Methods to form wide heater trenches and to form memory... Methods to form wide heater trenches and to form memory...

2011-07-26

2011-07-26

Sarkar, Asok K (Department: 2891)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S330000, C438S382000, C257SE21068, C257SE21645

Reexamination Certificate

active

07985616

ABSTRACT:
Embodiments of the present invention provide a method that includes providing a wafer including multiple cells, each cell including at least one emitter, and performing a lithographic operation on the wafer. The lithographic operation comprises forming heater trenches adjacent the emitters, each heater trench having a width that extends over at least respective portions of two cells. Other embodiments are also described.

REFERENCES:
patent: 2005/0001284 (2005-01-01), Pellizzer
patent: 2006/0073652 (2006-04-01), Pellizzer et al.
patent: 2008/0135824 (2008-06-01), Lai et al.

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