Multi-gas flow device

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Mechanical measurement system

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C702S048000, C702S052000, C702S053000

Reexamination Certificate

active

08010303

ABSTRACT:
A system and method of characterizing or controlling a flow of a fluid is provided that involves a sensor conduit and a bypass. A plurality of fluids may be utilized in the flow control device based on characteristic information of the device generated during calibration thereof. The characteristic information, in turn is based on a dimensionless parameters, such as adjusted dynamic pressure and adjusted Reynolds number.

REFERENCES:
patent: 4396300 (1983-08-01), Characklis et al.
patent: 5260865 (1993-11-01), Beauford et al.
patent: 5284053 (1994-02-01), Wadlow et al.
patent: 5861561 (1999-01-01), Van Cleve et al.
patent: 5911238 (1999-06-01), Bump et al.
patent: 5944048 (1999-08-01), Bump et al.
patent: 5975126 (1999-11-01), Bump et al.
patent: 6561218 (2003-05-01), Mudd
patent: 6575027 (2003-06-01), Larsen et al.
patent: 6826953 (2004-12-01), Wang
patent: 6962164 (2005-11-01), Lull et al.
patent: 7000463 (2006-02-01), Shajii et al.
patent: 7043374 (2006-05-01), Wang et al.
patent: 7107834 (2006-09-01), Meneghini et al.
patent: 7272512 (2007-09-01), Wang et al.
patent: 7636640 (2009-12-01), Wang et al.
patent: 2002/0198668 (2002-12-01), Lull
patent: 2004/0074311 (2004-04-01), Lull
patent: 0834723 (1998-04-01), None
Restriction Requirement date mailed Aug. 18, 2008 for U.S. Appl. No. 11/850,505.
Response filed Sep. 17, 2008 for U.S. Appl. No. 11/850,505.
Non-Final Office Action date mailed Dec. 10, 2008 for U.S. Appl. No. 11/850,505.
Response filed Jun. 10, 2009 for U.S. Appl. No. 11/850,505.
Notice of Allowance date mailed Aug. 7, 2009 for U.S. Appl. No. 11/850,505.
Non-Final Office Action date mailed Oct. 28, 2010 for U.S. Appl. No. 12/578,276.
Ressponse filed Jan. 28, 2011 for U.S. Appl. No. 12/578,276.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Multi-gas flow device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multi-gas flow device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-gas flow device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2733154

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.