Chemical apparatus and process disinfecting – deodorizing – preser – Analyzer – structured indicator – or manipulative laboratory... – Means for analyzing liquid or solid sample
Reexamination Certificate
2011-04-26
2011-04-26
Soderquist, Arlen (Department: 1777)
Chemical apparatus and process disinfecting, deodorizing, preser
Analyzer, structured indicator, or manipulative laboratory...
Means for analyzing liquid or solid sample
C356S301000, C422S082090, C422S091000, C436S037000, C436S086000, C436S091000, C436S096000, C436S164000, C436S171000, C436S183000, C436S524000, C436S525000
Reexamination Certificate
active
07931866
ABSTRACT:
The methods and apparatus disclosed herein concern nanoparticle layers uniformly distributed on a surface or substrate. In certain embodiments of the invention, the nanoparticle layers are of use for Raman spectroscopy. In certain embodiments of the invention, a micelle-metal ion complex is formed and deposited on a surface. The polymer component of the micelle-metal ion complex may be removed resulting in formation of nanoparticles of a uniform size and distribution. The polymers may contain one or more ligands. The number and type of ligands in a micelle will determine the type and amount of metal ion bound to the micelle, in turn determining the metal composition and size of the nanoparticles. The distribution micelle-metal ion complexes on a surface may determine the distribution and periodicity of the nanoparticle layer. In other embodiments, rod or columnar-shaped nanoparticles may be generated. Other embodiments concern the generation of uniform alloy nanoparticles.
REFERENCES:
Seregina, M. V. et al, Chemistry of Materials 1997, 9, 923-931.
Willert, M. et al, Chemistry of Materials 2001, 13, 4681-4685.
Niessen, H. G. et al, Journal of Molecular Catalysis A: Chemical 2002, 182-183, 463-470.
Chen, C.-W. et al, Chemistry of Materials 2002, 14, 2232-2239.
Sohn, B.-H. et al, Journal of the American Chemical Society 2003, 125, 6368-6369.
Abes, J. I. et al, Materials Science and Engineering C 2003, 23, 641-650.
Smid, J., Industrial and Engineering Chemistry Product Research and Development 1980, 19, 364-371.
Andrews, M. P. et al, Chemistry of Materials 1989, 1, 174-187.
Antonietti, M. et al, Angewandte Chemie International Edition, English 1997, 36, 910-928.
Loppacher, C. et al, Macromolecules 2002, 35, 1936-1940.
P.F. Liao, et al.; Chemical Physics Letters; 1981; No. 82; pp. 355-359.
P.F. Liao, et al.; Optics Letters; 1982; No. 7; pp. 483-485.
T. Vo-Dinh, et al.; Proceedings-APCA Annual Meeting; 1985; vol. 6; pp. 85-81.3.
J.P. Goudonnet, et al.; Chemical Physics; 1986; No. 106; pp. 225-232.
T. Vo-Dinh, et al.; Analytica Chimica Acta; 1986; No. 181; pp. 139-148.
P.D. Enlow, et al.; Analytical Chemistry; 1986; No. 58, pp. 1119-1123.
B.K. Russell, et al.; Physical Review B; 1987; No. 35; pp. 2151-2154.
A.H.R. Al-Obaidi, et al.; Journal of Physical Chemistry; 1994; pp. 11163-11168.
A. Roescher, et al.; Polymeric Materials Science & Engineering; 1995; pp. 283-284.
J.P. Spatz, et al.; Advanced Materials; 1996; No. 8; pp. 337-340.
C. Sangregorio, et al.; Langmuir; 1996; No. 12; pp. 5800-5802.
S.T. Selvan, et al.; Advanced Materials; 1998; No. 10; pp. 132-134.
J.P. Spatz, et al.; Journal of Luminescence; 1998; Nos. 76-77; pp. 168-173.
M.P. Pileni; Supramolecular Science; 1998; No. 5; pp. 321-329.
J.P. Spatz, et al.; Advanced Materials; 1999; No. 11; pp. 149-153.
A. Taleb, et al.; Physical Review B; 1999; No. 59; pp. 13350-13358.
L. Bronstein, et al.; Chemistry of Materials; 1999; No. 11, pp. 1402-1405.
S.T. Selvan, et al.; Journal of Physical Chemistry B; 1999; No. 103; pp. 7441-7448.
K. Seeger, et al.; Journal of Physics D: Applied Physics; 1999; No. 32; pp. L129-L132.
P.A. Lewis, et al.; Journal of Vacuum Science & Technology B; 1999; No. 17; pp. 3239-3243.
T. Tada, et al.; Japanese Journal of Applied Physics—Part 1; 1999; No. 38; pp. 7253-7256.
J.P. Spatz, et al.; Langmuir 2000; No. 16; pp. 407-415.
M.P. Pileni; Pure and Applied Chemistry 2000; No. 72; pp. 53-65.
B. Koslowski, et al.; Journal of Applied Physics 2000; No. 87; pp. 7533-7538.
L.M. Bronstein, et al.; Journal of Catalysis 2000; No. 196; pp. 302-314.
M.L. Wu, et al.; Langmuir 2001; No. 17; pp. 3877-3883.
A. Wellner, et al.; Microelectronic Engineering 2001; Nos. 57-58; pp. 919-924.
B.H. Sohn, et al.; Journal of American Chemical Society 2001; No. 123; pp. 12734-12735.
B.L. Frankamp et al.; Journal of the American Chemical Society 2002; No. 124; pp. 892-893.
Y. Boontongkong, et al.; Macromolecules 2002; No. 35; pp. 3647-3652.
J.H. Youk, et al.; Langmuir 2002; No. 18; pp. 2455-2458.
V. Z-H. Chan, et al.; Materials Research Society Symposium Proceedings 2002; No. 676; pp. Y4.4.1-Y4.4.6.
V.V. Poborchii, et al.; Optics Communications 2002; No. 210; pp. 285-290.
S. Liu, et al.; Langmuir 2002; No. 18; pp. 8350-8357.
M.S. Pio, et al.; Materials Research Society Symposium Proceedings 2002; No. 729; pp. 179-184.
J.P. Spatz, et al.; Advanced Materials 2002; No. 14; pp. 1827-1832.
V. Poborchii, et al.; Applied Physics Letters 2003; No. 82; pp. 508-510.
R. Glass, et al.; Advanced Functional Materials 2003; No. 13; pp. 569-575.
R. Glass, et al.; Nanotechnology 2003; No. 14; pp. 1153-1160.
M-V. Meli, et al.; Langmuir 2003; No. 19; pp. 9097-9100.
Q. Song, et al.; Journal of Nanoparticle Research 2000; No. 2; pp. 381-385.
W. Huang, et al.; Nanotechnology 2003; No. 14; pp. 1075-1080.
M. Antonetti, et al.; Macromolecules 1996; No. 29; pp. 3800-3806.
M. Moeller, et al.; Polymeric Materials Science and Engineering 1999; No. 80; pp. 3-4.
P. Persigehl, et al.; Macromolecules 2000; No. 33; pp. 6977-6981.
Intel Corporation
Pillsbury Winthrop Shaw & Pittman LLP
Soderquist Arlen
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