Exposure apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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Details

C355S030000

Reexamination Certificate

active

07978305

ABSTRACT:
An exposure apparatus which exposes a pattern of an original onto a substrate via a projection optical system in a state in which a gap between the projection optical system and the substrate is filled with a liquid. A liquid supply unit supplies liquid to the gap. A front side degassing unit performs a degassing to the liquid prior to being supplied to the gap. A dissolved gas measurement unit is provided on the downstream side of the front side degassing unit, and a rear side degassing unit is provided on the downstream side of the dissolved gas measuring unit. The front side degassing unit has a dissolved oxygen control unit, which controls a supply amount of nitrogen gas so as to be the amount of dissolved oxygen, measured by the dissolved gas measurement unit, to a predetermined value.

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Korean Office Action dated Feb. 17, 2010, issued in corresponding Korean patent application No. 10-2008-0054881.
Japanese Office Action dated Jul. 17, 2009, issued in corresponding Japanese patent application No. 2007-173110.

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