Method and apparatus to improve filter characteristics of...

Optical: systems and elements – Diffraction – From grating

Reexamination Certificate

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C359S558000, C359S566000, C359S569000, C257S294000, C257SE21130, C438S048000, C438S057000, C438S069000

Reexamination Certificate

active

07965444

ABSTRACT:
An optical filter structure for an imager which has customized sub-wavelength elements used to maintain the filter characteristics accordingly across a photo-conversion device to optimize the structure for the angle of incidence as it changes across the imager photo-conversion device. In particular, the layout (e.g., grating period among other parameters) of the sub-wavelength elements used in the structure design are customized to change with the angle of incidence of the optics used to project the image. The sub-wavelength elements are typically built by high resolution lithographic processes such as optical or imprint lithography.

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