Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate
2011-08-23
2011-08-23
Pham, Thanh V (Department: 2894)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
Optical characteristic sensed
C438S401000, C438S462000, C257S283000, C257S797000, C356S138000
Reexamination Certificate
active
08003412
ABSTRACT:
A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction minor arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.
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Fox Benjamin A.
Gibbs Nathaniel J.
Granados Axel A.
Maki Andrew B.
Timpane Trevor J.
International Business Machines - Corporation
Pham Thanh V
Schmeiser Olsen & Watts
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