Semiconductor device and method for manufacture thereof

Fishing – trapping – and vermin destroying

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437 40, 437190, 437192, 437200, H01L 21265

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050932748

ABSTRACT:
A semiconductor device, such as a MESFET having a self-aligned gate, and a method for production thereof. A triple layer film is formed on the semiconductor substrate, then anisotropically etched to produce a gate structure which is used as a mask in an ion implantation step for forming a source and drain. The triple layer film includes a lower high melting point metal silicide, an upper similar metal silicide and an intermediate high melting point metal layer. The first layer forms a Schottky barrier with the semiconductor substrate and serves as a metal silicide gate. The upper layer serves as a dummy gate. The intermediate metal layer serves to protect the metal silicide layers during the etching step, serves as an etchant stop during removal of the dummy gate, and also serves to protect the Schottky barrier after the device is completed. After removal of the dummy gate, a low resistance metal such as gold is self-alignedly deposited in its place and serves to improve the high frequency performance of the device.

REFERENCES:
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patent: 4322453 (1982-03-01), Miller
patent: 4574298 (1986-03-01), Yamagishi et al.
patent: 4700455 (1987-10-01), Shimada et al.
patent: 4923823 (1990-05-01), Kohno

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