Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

2011-04-19

2011-04-19

Hassanzadeh, Parviz (Department: 1716)

Coating apparatus

With heat exchange, drying, or non-coating gas or vapor...

C134S153000

Reexamination Certificate

active

07926439

ABSTRACT:
A coating device includes a box-shaped processing chamber. Slits are respectively provided on four side surfaces of the processing chamber. A box-shaped housing is provided so as to surround the processing chamber. A space is formed between the processing chamber and the housing. A fan filter unit for forming downflow in the space is provided on the top of the housing. Air supplied to the fan filter unit is cleaned by the fan filter unit, and is supplied to the space. The air supplied to the space is supplied to the processing chamber through each of the slits in the processing chamber. This causes a twister-shaped air current to be generated within the processing chamber.

REFERENCES:
patent: 6752543 (2004-06-01), Fukutomi et al.
patent: 6977098 (2005-12-01), Gurer et al.
patent: 2002/0036066 (2002-03-01), Ogawa et al.
patent: 2005/0173068 (2005-08-01), Chen et al.
patent: 2000-24575 (2000-01-01), None
patent: 2000024575 (2000-01-01), None
patent: 2003-347186 (2003-12-01), None
Machine Translation of JP2000024575.
Translation of JP 2000024575 A.

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