Composite semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

Reexamination Certificate

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Details

C257S211000, C257S760000, C257SE21627

Reexamination Certificate

active

07928572

ABSTRACT:
A composite semiconductor device includes a substrate; a plurality of circuits formed on the substrate; one or more wiring layers each including a plurality of wiring patterns connected to circuits of the plurality of circuits, a plurality of dummy patterns electrically isolated from the plurality of circuits, and an interlayer dielectric film that is spin-coated directly onto the wiring patterns and onto the dummy patterns, and that is a spin-coated layer, the dummy patterns being formed in areas where the wiring patterns are absent and lying substantially in a plane in which the wiring patterns lie; and a semiconductor thin film layer including semiconductor device elements and disposed on an upper most surface of the one or more wiring layers. The spin-coated layer may be formed of an organic material or an oxide material.

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patent: 6583446 (2003-06-01), Taninaka et al.
patent: 6787825 (2004-09-01), Gudesen et al.
patent: 7759798 (2010-07-01), Chibahara et al.
patent: 2003/0185068 (2003-10-01), Saito et al.
patent: 2004/0094791 (2004-05-01), Ito et al.
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patent: 2006/0238467 (2006-10-01), Hung et al.
patent: 2008/0087928 (2008-04-01), Nagai
patent: 1501493 (2004-06-01), None
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patent: 1 347 516 (2003-09-01), None
patent: 1 434 269 (2004-06-01), None
patent: 2004-207325 (2004-07-01), None

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