Diagnosis and calibration system for ICP-MS apparatus

Data processing: measuring – calibrating – or testing – Calibration or correction system – Linearization of measurement

Reexamination Certificate

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Details

C702S085000, C702S179000, C702S180000, C702S181000, C702S182000, C250S281000, C250S282000, C250S288000, C250S289000

Reexamination Certificate

active

07869968

ABSTRACT:
A diagnostic system designed such that an aggregate of parameter combinations is stored, which is an aggregate of combinations of parameters consisting of a first parameter for determining the output of the high-frequency power source, a second parameter for determining the flow rate of the carrier gas in the aerosol, and a third parameter for determining the distance between the plasma torch and the interface, and which forms a specific array such that the measurement points corresponding to the respective combinations are lined up in order along the direction of length of an envelope that forms the end on the high-sensitivity side of a graph drawn as an aggregate of all measurement points on a sensitivity-oxide ion ratio graph, and a diagnostic measurement is performed with a specific diagnostic sample using the parameter value of each combination of the above-mentioned parameter combinations that form the aggregate such that the device properties can be confirmed from the position on the envelope on the sensitivity-oxide ion ratio graph of the actual measurement points corresponding to each combination.

REFERENCES:
patent: 5185523 (1993-02-01), Kitagawa et al.
patent: 5334834 (1994-08-01), Ito et al.
patent: 2008/0035844 (2008-02-01), Sakata et al.
patent: 102007032176 (2008-08-01), None
patent: 01-124951 (1989-05-01), None
patent: 11-006788 (1999-01-01), None
Office Action of Mar. 3, 2010 from German patent application 10 2007 046 367.9-54 (note both the German-language and English-language translations are provided).

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