Semiconductor constructions

Active solid-state devices (e.g. – transistors – solid-state diode – Physical configuration of semiconductor

Reexamination Certificate

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C257SE21219, C430S270100

Reexamination Certificate

active

07944025

ABSTRACT:
The invention includes a process whereby a solvent is utilized to remove soluble portions of a resist, and subsequently the solvent can be removed with a gas-fortified liquid. In particular aspects, the gas-fortified liquid emits bubbles during the removal of the solvent. Additionally, the gas-fortified liquid can be utilized to remove residual resist scum, and in such aspects the gas-fortified liquid can emit bubbles during the scum removal.

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Memorandum To: Dr. Roger Bonneccaze From: Cyrus R. Tabery Date: May 4, 2000 Subject: A report on shear and bending of a resist beam under the influence of surface tension forces; found at http://willson.cm.utexas.edu/ResearchSub.
NanoTech Wisconsin;Resist Collapse: Determination of Elastic Constants, by Kevin Van Workum et al.; May 3, 1999; found at http://www.xraylith.wise.edu/˜vanw/seminar/kevin.pdf.

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