Apparatus and method for providing heated effluent gases to...

Gas separation: processes – Liquid contacting

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C095S227000, C095S229000, C096S266000, C096S270000, C096S271000, C096S322000

Reexamination Certificate

active

07942951

ABSTRACT:
A low-maintenance scrubber inlet device is provided for delivering effluent gases to gas scrubbers. The scrubber inlet device may comprise an interior volume configured to receive effluent gases and direct the effluent gases into the scrubber while maintaining the temperature of the effluent gases. In some instances, a heated gas is introduced to maintain the effluent gas temperature. The scrubber interface device is configured to deliver the effluent gas stream from the inlet manifold to the gas scrubbing system, and to have a very low susceptibility to clogging.

REFERENCES:
patent: 2608695 (1952-09-01), Skibowski
patent: 3544086 (1970-12-01), Willett
patent: 3628311 (1971-12-01), Costarella
patent: 3681895 (1972-08-01), Zirngibl et al.
patent: 3690044 (1972-09-01), Boresta
patent: 3841061 (1974-10-01), Pike
patent: 3888955 (1975-06-01), Maruko
patent: 4986838 (1991-01-01), Johnsgard
patent: 5019339 (1991-05-01), Keeney et al.
patent: 5271908 (1993-12-01), Shiban et al.
patent: 5405590 (1995-04-01), Macedo et al.
patent: 5560893 (1996-10-01), Okino et al.
patent: 5756052 (1998-05-01), Suzumura et al.
patent: 5766563 (1998-06-01), Tanaka et al.
patent: 5832843 (1998-11-01), Park et al.
patent: 5846275 (1998-12-01), Lane et al.
patent: 5878922 (1999-03-01), Boring
patent: 5882366 (1999-03-01), Holst et al.
patent: 5927957 (1999-07-01), Kennedy et al.
patent: 5935283 (1999-08-01), Sweeney et al.
patent: 5955037 (1999-09-01), Holst et al.
patent: 6029100 (2000-02-01), Iwashita et al.
patent: 6084148 (2000-07-01), Shiban et al.
patent: 6090208 (2000-07-01), Han
patent: 6322756 (2001-11-01), Arno et al.
patent: 6331281 (2001-12-01), Teru et al.
patent: 6333010 (2001-12-01), Holst et al.
patent: 6517792 (2003-02-01), Shimizu et al.
patent: 6530977 (2003-03-01), Seeley et al.
patent: 6759018 (2004-07-01), Arno et al.
patent: 7214349 (2007-05-01), Holst et al.
patent: 7316721 (2008-01-01), Redden et al.
patent: 7534399 (2009-05-01), Shiban
patent: 7550123 (2009-06-01), Temple et al.
patent: 7601307 (2009-10-01), Shiban
patent: 7611684 (2009-11-01), Johnsgard et al.
patent: 7635501 (2009-12-01), Komai et al.
patent: 2001/0001645 (2001-05-01), Lee et al.
patent: 2001/0009652 (2001-07-01), Arno
patent: 2001/0032543 (2001-10-01), Seeley et al.
patent: 2004/0101460 (2004-05-01), Arno et al.
patent: 2004/0202596 (2004-10-01), Honjo et al.
patent: 2004/0213721 (2004-10-01), Arno et al.
patent: 2004/0216610 (2004-11-01), Tom et al.
patent: 2005/0031500 (2005-02-01), Feng
patent: 2005/0085057 (2005-04-01), Hashikura et al.
patent: 2005/0276739 (2005-12-01), Shiban
patent: 2006/0104878 (2006-05-01), Chiu
patent: 2007/0172398 (2007-07-01), Clark
patent: 2008/0038171 (2008-02-01), Johnsgard et al.
patent: 2008/0233024 (2008-09-01), Lindau et al.
patent: 2009/0205495 (2009-08-01), Johnsgard et al.
patent: 2010/0015021 (2010-01-01), Johnsgard et al.
patent: 20 45 021 (1972-03-01), None
patent: 0 429 942 (1991-06-01), None
patent: 1 361 725 (1964-05-01), None
patent: 1 328 990 (1973-09-01), None
U.S. Appl. No. 12/567,459, filed Sep. 25, 2009, Mark Johnsgard, Effluent Gas Scrubbing.
U.S. Appl. No. 12/284,035, filed Sep. 17, 2008, Mark Johnsgard, Reactive Gas Control.
U.S. Appl. No. 10/804,764, filed Mar. 19, 2004, Mark Johnsgard, Apparatus and Method For Providing Heated Effluent Gases to a Scrubber.
U.S. Appl. No. 11/891,075, filed Aug. 8, 2007, Mark Johnsgard, Effluent Gas Scrubber and Method for Scrubbing Effluent Gasses.
Forderkennzeichen: 254 116 98. Thema: Verfahrensentwicklung zur Herstellung von Solar-Silicium im halbtechnischen Mabstab (Process Development for Manufacturing of Solar Silicon in Semi-Technical Scale), R. Kummel, & J. Danzig, Fraunhofer Institute Annual Report (Jun. 2002).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for providing heated effluent gases to... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for providing heated effluent gases to..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for providing heated effluent gases to... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2693406

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.