Pattern-driven routing

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification

Reexamination Certificate

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Details

C716S050000, C716S126000, C716S130000

Reexamination Certificate

active

07926005

ABSTRACT:
A method and system for pattern-driven routing are disclosed. Embodiments of pattern-driven routing are disclosed for creating a representation for at least a portion of an initial routing solution, comparing the representation for at least the portion of the initial routing solution with a pattern, and determining whether the initial routing solution has lithographic issues based on the comparison.

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Huang, L., Optical proximity correction (OPC): friendly maze routing, Proceeding DAC '04 Proceedings of the 41st annual Design Automation Conference, 2004, pp. 186-191.

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