Micromachine device with a spatial portion formed within

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal

Reexamination Certificate

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Details

C257S415000, C257S416000, C257S417000, C257SE23180

Reexamination Certificate

active

08008735

ABSTRACT:
A semiconductor element of the electric circuit includes a semiconductor layer over a gate electrode. The semiconductor layer of the semiconductor element is formed of a layer including polycrystalline silicon which is obtained by crystallizing amorphous silicon by heat treatment or laser irradiation, over a substrate. The obtained layer including polycrystalline silicon is also used for a structure layer such as a movable electrode of a structure body. Therefore, the structure body and the electric circuit for controlling the structure body can be formed over one substrate. As a result, a micromachine can be miniaturized. Further, assembly and packaging are unnecessary, so that manufacturing cost can be reduced.

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Office Action, Chinese Application No. 200710088154.0; mailed Aug. 23, 2010, 21 pages with English translation.
Plummer et al., “Modern CMOS Technology,” Silicon VLSI Technology: Fundamentals, Practice and Modeling, Apr. 30, 2003, pp. 49-51/84-92.

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