Termination and contact structures for a high voltage...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S076000, C257S188000

Reexamination Certificate

active

07939853

ABSTRACT:
A semiconductor device is provided that includes a substrate, a first active layer disposed over the substrate, and a second active layer disposed on the first active layer. The second active layer has a higher bandgap than the first active layer such that a two-dimensional electron gas layer arises between the first active layer and the second active layer. A termination layer, which is disposed on the second active layer, includes InGaN. Source, gate and drain contacts are disposed on the termination layer.

REFERENCES:
patent: 7026665 (2006-04-01), Smart et al.
patent: 2006/0108606 (2006-05-01), Saxler et al.
patent: 2006/0244010 (2006-11-01), Saxler

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Termination and contact structures for a high voltage... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Termination and contact structures for a high voltage..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Termination and contact structures for a high voltage... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2688872

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.