Sputtering apparatus, method of driving the same, and method...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Reexamination Certificate

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Details

C204S298180, C204S298200, C204S298230

Reexamination Certificate

active

07981263

ABSTRACT:
A sputtering apparatus includes a susceptor having a substrate and a plurality of target devices facing the substrate and substantially parallel to each other, each target device being rotatable.

REFERENCES:
patent: 6800183 (2004-10-01), Takahashi
patent: 6964731 (2005-11-01), Krisko et al.
patent: 2004/0231973 (2004-11-01), Sato et al.
patent: 1572900 (2005-02-01), None
patent: 11-209872 (1999-08-01), None
patent: 2004-346387 (2004-12-01), None

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