Manufacturing method for vibrator

Etching a substrate: processes – Gas phase etching of substrate

Reexamination Certificate

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Reexamination Certificate

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07901587

ABSTRACT:
After an external shape of a photoresist layer is patterned with use of a Cr film as an underlayer, i.e., a metal film to serve as an anticorrosive film that resists crystal etching, and an Au film as a surface layer, the Au film is etched. After groove portions are then patterned, the Cr film is etched. Since no degenerated-surface layer cannot be formed on the photoresist layer with an etchant for the Au film, the groove portions can be patterned without any degenerated-surface layer according to this method, so that high-accuracy groove portions can be formed.

REFERENCES:
patent: 5137700 (1992-08-01), Sloan
patent: 5-315881 (1993-11-01), None
patent: 2002-076806 (2002-03-01), None
patent: 2002076806 (2002-03-01), None
patent: 2003-347885 (2003-12-01), None
patent: 3543772 (2004-04-01), None
patent: 2004-254173 (2004-09-01), None
Fumitaka et al, JP 2002-076806 Machine Translation.
Osamu, JP 2003-347885 Machine Translation.
Hideaki, JP 2002-261557, Machine Translation.

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