Etching a substrate: processes – Forming or treating article containing magnetically...
Reexamination Certificate
2011-06-28
2011-06-28
Tran, Binh X (Department: 1713)
Etching a substrate: processes
Forming or treating article containing magnetically...
C216S044000, C216S066000, C216S081000
Reexamination Certificate
active
07967993
ABSTRACT:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a hard mask and a resist on a magnetic recording layer, imprinting a stamper on the resist to transfer patterns of protrusions and recesses, removing resist residues left in the recesses of the patterned resist, etching the hard mask using the patterned resist as a mask to transfer the patterns of protrusions and recesses, stripping the resist, and performing ion beam etching to remove the remaining hard mask and to modify a surface of the magnetic recording layer uncovered with the remaining hard mask.
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Isowaki Yousuke
Kamata Yoshiyuki
Kimura Kaori
Sakurai Masatoshi
Kabushiki Kaisha Toshiba
Knobbe Martens Olson & Bear LLP
Tran Binh X
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