Methods of forming and using reticles

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S394000

Reexamination Certificate

active

07932003

ABSTRACT:
Some embodiments include methods of treating reticles to provide backside masking across regions of the reticle to compensate for problems occurring during photolithographic processing. The problems may be, for example, defects in the reticle, problems associated with deposition or development of photoresist, or problems associated with substrate topography. The masking may alter one or both of transmission of electromagnetic radiation through the masked regions, and polarization of electromagnetic radiation passed through the masked regions. Some embodiments include reticles having patterns along front sides for patterning electric magnetic radiation, and masks across portions of the backsides to at least partially block transmission of electromagnetic radiation through portions of the patterns.

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Zait Eitan et al: “CD variations correction by local transmission control of photomasks done with a novel laser based process” Proceedings of SPIE, The International Society for Optical Engineering; Metrology, Inspection, and Process Control for Microlithography 2006, vol. 6152 II, 6 pages.
PCT/US2008/060443, Publication Date Mar. 31, 2009, PCT Int'l Search Report.
PCT/US2008/060443, Publication Date Mar. 31, 2009, PCT Written Opinion of the ISA.

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