Semiconductor device which includes a capacitor and an...

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

Reexamination Certificate

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C257S535000, C257SE21664, C257SE29343

Reexamination Certificate

active

07868420

ABSTRACT:
A semiconductor device includes a semiconductor substrate and a capacitor which is disposed on a principal surface of the semiconductor substrate. The capacitor includes a lower electrode film disposed on the principal surface of the semiconductor substrate, a dielectric film disposed on the lower electrode and an upper electrode film disposed on the dielectric film. The semiconductor device further includes an interconnection film which includes a portion disposed on the upper electrode film so as to be electrically coupled to the upper electrode film. Directions of residual stresses of the upper electrode film coincide with directions of residual stresses of the portion of the interconnection film. Each of the upper electrode film and the interconnection film may include at least one of platinum and iridium. Also, there is provided a method of manufacturing the semiconductor device.

REFERENCES:
patent: 6162649 (2000-12-01), Kweon et al.
patent: 6200821 (2001-03-01), Baek
patent: 6201271 (2001-03-01), Okutoh et al.
patent: 6379977 (2002-04-01), Sun et al.
patent: 6642100 (2003-11-01), Yang et al.
patent: 7294876 (2007-11-01), Joo et al.
patent: 2004/0185635 (2004-09-01), Tatsunari
patent: 2004/0262655 (2004-12-01), Kweon
patent: 2006/0024906 (2006-02-01), Abe
patent: 2006/0220083 (2006-10-01), Abe
patent: 5102153 (1993-04-01), None

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