Apparatus, system, and method for modeling, projecting, and...

Data processing: financial – business practice – management – or co – Automated electrical financial or business practice or... – Operations research or analysis

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07941332

ABSTRACT:
An apparatus, system, and method are disclosed for modeling and optimizing an enterprise application system. The apparatus, in one embodiment, is configured to determine the system processing capacity and workload characteristics. The apparatus is further configured to determine optimization parameters, including the system processor utilization, minimum job acquiring rates for data entry points of the system, and software component multi-parallelism recommendations. A method is disclosed, in one embodiment, to report the optimization parameters and to implement the optimization parameters within the system during run-time.

REFERENCES:
patent: 5031089 (1991-07-01), Liu et al.
patent: 5799173 (1998-08-01), Gossler et al.
patent: 5899986 (1999-05-01), Ziauddin
patent: 5960423 (1999-09-01), Chaudhuri et al.
patent: 6029163 (2000-02-01), Ziauddin
patent: 6460122 (2002-10-01), Otterness et al.
patent: 6574605 (2003-06-01), Sanders et al.
patent: 6606585 (2003-08-01), Borowsky et al.
patent: 6631354 (2003-10-01), Leymann et al.
patent: 6631422 (2003-10-01), Althaus et al.
patent: 6636905 (2003-10-01), McNamer et al.
patent: 6691067 (2004-02-01), Ding et al.
patent: 6895585 (2005-05-01), Smith
patent: 6910061 (2005-06-01), Hu et al.
patent: 6957211 (2005-10-01), Tyulenev et al.
patent: 7028302 (2006-04-01), Kiick
patent: 2004/0078782 (2004-04-01), Clement et al.
patent: 2007/0083500 (2007-04-01), Zibitsker

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus, system, and method for modeling, projecting, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus, system, and method for modeling, projecting, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus, system, and method for modeling, projecting, and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2658455

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.