Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2011-01-18
2011-01-18
Coleman, W. David (Department: 2823)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C257SE21219, C216S002000
Reexamination Certificate
active
07871936
ABSTRACT:
A reduction in contaminating impurities in a TFT, and a TFT which is reliable, is obtained in a semiconductor device which uses the TFT. By removing contaminating impurities residing in a film interface of the TFT using a solution containing fluorine, a reliable TFT can be obtained.
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Kadono Masaya
Kitakado Hidehito
Yamauchi Yukio
Yamazaki Shunpei
Coleman W. David
Husch Blackwell Sanders LLP Welsh & Katz
Semiconductor Energy Laboratory Co,. Ltd.
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