Methods of manufacturing active matrix substrate and organic...

Details Methods of manufacturing active matrix substrate and organic... Methods of manufacturing active matrix substrate and organic...

2011-08-02

2011-08-02

Ghyka, Alexander G (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S022000, C438S023000, C438S082000, C438S099000, C438S149000, C257SE21320, C257SE21372, C257SE27112, C257SE51005

Reexamination Certificate

active

07989240

ABSTRACT:
A method of manufacturing an active matrix substrate that enables increased productivity due to a reduction in the number of patterning processes and low generation of particles during the patterning processes. The method includes forming a patterned electrode on a substrate, and covering the first electrode with an insulating film. A mono-crystalline semiconductor layer is then formed on the insulating film by attaching a first layer formed on a surface of a semiconductor wafer to the first insulating film, and peeling off a portion of the semiconductor wafer. The semiconductor layer is then patterned and doped, in part, by utilizing the patterned electrode as a photo mask for light illuminated from a lower side of the substrate. This results in part in mono-crystalline active layers for thin film transistors, which are then configured to form a pixel for an active matrix substrate.

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