Photo development apparatus and method for fabricating a...

Photography – Fluid-treating apparatus

Reexamination Certificate

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Details

C396S578000

Reexamination Certificate

active

07874748

ABSTRACT:
A photo development apparatus for use in fabricating a color filter substrate for a display panel is disclosed. The disclosed photo apparatus includes a development solution supplier to supply a negative development solution. The photo apparatus also includes a first photo apparatus to form a positive photo-resist pattern to be used in forming a black matrix, wherein the positive photo-resist pattern is formed by patterning a light shielding layer formed on a substrate using the negative development solution and a positive photo-resist.

REFERENCES:
patent: 7638246 (2009-12-01), Paek
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patent: 2001-183824 (2001-07-01), None
patent: 2002-258479 (2002-09-01), None
patent: 2003-043685 (2003-02-01), None
patent: 2004-109968 (2004-04-01), None
patent: 2007-0028767 (2007-03-01), None

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