Substrate cleaning apparatus and substrate cleaning method

Details Substrate cleaning apparatus and substrate cleaning method Substrate cleaning apparatus and substrate cleaning method

2011-06-14

2011-06-14

Stinson, Frankie L (Department: 1711)

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

C134S186000, C134S902000

Reexamination Certificate

active

07958899

ABSTRACT:
At a vibration applying position, ultrasonic vibration is applied upon a liquid film which is on a surface of a substrate. Concurrently with this, at a drop arrival position which is different from the vibration applying position, drops of a cleaning liquid are supplied to the liquid film, whereby wave-generating vibration which is different from the ultrasonic vibration is applied upon the liquid film. This dramatically improves removal of particles adhering to the surface of the substrate as compared with mere application of ultrasonic vibration. Hence, even when the output, the frequency and the like of the ultrasonic vibration are set to such an extent not damaging the substrate, it is possible to effectively remove particles with the wave-generating vibration and favorably clean the surface of the substrate.

REFERENCES:
patent: 6021789 (2000-02-01), Akatsu et al.
patent: 6039059 (2000-03-01), Bran
patent: 6140744 (2000-10-01), Bran
patent: 6295999 (2001-10-01), Bran
patent: 6431184 (2002-08-01), Taniyama
patent: 6463938 (2002-10-01), Bran
patent: 6669809 (2003-12-01), Hashimoto et al.
patent: 6681782 (2004-01-01), Bran
patent: 6684891 (2004-02-01), Bran
patent: 6699330 (2004-03-01), Muraoka
patent: 6791242 (2004-09-01), Beck et al.
patent: 6864187 (2005-03-01), Tomimori et al.
patent: 6983755 (2006-01-01), Nam et al.
patent: 7117876 (2006-10-01), Bran
patent: 7211932 (2007-05-01), Bran
patent: 7268469 (2007-09-01), Bran
patent: 2002/0011256 (2002-01-01), Bran
patent: 2003/0010357 (2003-01-01), Bran
patent: 2003/0015218 (2003-01-01), Bran
patent: 2004/0206371 (2004-10-01), Bran
patent: 2006/0021636 (2006-02-01), Miya
patent: 2006/0175935 (2006-08-01), Bran
patent: 2006/0180186 (2006-08-01), Bran
patent: 2006/0272685 (2006-12-01), Honda et al.
patent: 2008/0006292 (2008-01-01), Bran
patent: 07-066164 (1995-03-01), None
patent: 09-260277 (1997-10-01), None
patent: 11-244796 (1999-09-01), None
patent: 2000-210629 (2000-08-01), None
patent: 2001-87725 (2001-04-01), None
patent: 2003-318148 (2003-11-01), None
patent: 2003-318154 (2003-11-01), None
patent: 3493492 (2004-02-01), None
patent: 2005-085978 (2005-03-01), None
patent: 2006-41444 (2006-02-01), None
patent: 2006-326486 (2006-12-01), None
patent: 2007-027241 (2007-02-01), None
patent: 2008-144107 (2008-06-01), None
patent: 10-0464118 (2005-06-01), None
European Patent Office 1 179 618 Feb. 2002.
Office Action issued May 28, 2010 in connection with corresponding Korean Patent Application No. 2008-74961.

Affiliated with

Also associated with

Rating

Substrate cleaning apparatus and substrate cleaning method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate cleaning apparatus and substrate cleaning method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate cleaning apparatus and substrate cleaning method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2653473