System and method for making photomasks

Details System and method for making photomasks System and method for making photomasks

2011-07-19

2011-07-19

Siek, Vuthe (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Manufacturing optimizations

C716S055000

Reexamination Certificate

active

07984393

ABSTRACT:
The present disclosure is directed a method for preparing photomask patterns. The method comprises receiving drawn pattern data for a design database, the drawn pattern data describing device circuit features and dummy features. The dummy features have first target patterns. Mask pattern data is generated for the dummy features, wherein one or more of the dummy features have second target patterns that are different from the first target patterns. The mask pattern data is corrected for proximity effects.

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