Absorption type multi-layer film ND filter and process for...

Optical: systems and elements – Absorption filter – Neutral or graded density

Reexamination Certificate

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C359S586000

Reexamination Certificate

active

07894148

ABSTRACT:
An absorption type multi-layer film ND filter having a substrate formed of a resin film and on at least one side thereof an absorption type multi-layer film of oxide dielectric film layers and absorption film layers which are alternately wherein the oxide dielectric film layers are each a SiCyOx (0<y≦0.1, 1.5<x<2) film having an extinction coefficient at a wavelength of 550 nm of 0.005 to 0.05, formed by a physical vapor deposition process using a film-forming material composed chiefly of SiC and Si, and the absorption film layers are each a metal film having a refractive index at a wavelength of 550 nm of 1.5 to 3.0 and an extinction coefficient at that wavelength of 1.5 to 4.0, formed by a physical vapor deposition process; an outermost layer of the multi-layer film being one oxide dielectric film layer of SiCyOx.

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patent: 7388723 (2008-06-01), Kunii
patent: 7440204 (2008-10-01), Kunii
patent: 2003/0026014 (2003-02-01), Kunii
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patent: 3359114 (2002-10-01), None
patent: 2003-43211 (2003-02-01), None
patent: 2003-322709 (2003-11-01), None
patent: WO 01/27345 (2001-04-01), None
patent: WO 2004/011690 (2004-02-01), None
patent: WO 2005/047940 (2005-05-01), None

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