Semiconductor devices and assemblies including back side...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Junction field effect transistor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE25032, C257S099000, C257S291000, C257S432000, C438S048000

Reexamination Certificate

active

07994547

ABSTRACT:
Low temperature processed back side redistribution lines (RDLs) are disclosed. Low temperature processed back side RDLs may be electrically connected to the active surface devices of a semiconductor substrate using through wafer interconnects (TWIs). The TWIs may be formed prior to forming the RDLs, after forming the RDLs, or substantially simultaneously to forming the RDLs. The material for the back side RDLs and various other associated materials, such as dielectrics and conductive via filler materials, are processed at temperatures sufficiently low so as to not damage the semiconductor devices or associated components contained on the active surface of the semiconductor substrate. The low temperature processed back side RDLs of the present invention may be employed with optically interactive semiconductor devices and semiconductor memory devices, among many others. Semiconductor devices employing the RDLs of the present invention may be stacked and electrically connected theretogether.

REFERENCES:
patent: 3648131 (1972-03-01), Stuby
patent: 3761782 (1973-09-01), Youmans
patent: 4499655 (1985-02-01), Anthony
patent: 4772936 (1988-09-01), Reding et al.
patent: 4833521 (1989-05-01), Early
patent: 4862322 (1989-08-01), Bickford et al.
patent: 4948754 (1990-08-01), Kondo et al.
patent: 4998159 (1991-03-01), Shinohara et al.
patent: 5082802 (1992-01-01), Gelsomini
patent: 5138434 (1992-08-01), Wood et al.
patent: 5147815 (1992-09-01), Casto
patent: 5168345 (1992-12-01), Brossart
patent: 5216278 (1993-06-01), Lin et al.
patent: 5229647 (1993-07-01), Gnadinger
patent: 5239198 (1993-08-01), Lin et al.
patent: 5246880 (1993-09-01), Reele et al.
patent: 5281151 (1994-01-01), Arima et al.
patent: 5289346 (1994-02-01), Carey et al.
patent: 5291062 (1994-03-01), Higgins, III
patent: 5311057 (1994-05-01), McShane
patent: 5327008 (1994-07-01), Djennas et al.
patent: 5327013 (1994-07-01), Moore et al.
patent: 5334857 (1994-08-01), Mennitt et al.
patent: 5355283 (1994-10-01), Marrs et al.
patent: 5365409 (1994-11-01), Kwon et al.
patent: 5376825 (1994-12-01), Tukamoto et al.
patent: 5379191 (1995-01-01), Carey et al.
patent: 5384487 (1995-01-01), Rostoker et al.
patent: 5386142 (1995-01-01), Kurtz et al.
patent: 5386341 (1995-01-01), Olson et al.
patent: 5399903 (1995-03-01), Rostoker et al.
patent: 5422163 (1995-06-01), Kamiyama et al.
patent: 5424492 (1995-06-01), Petty et al.
patent: 5438224 (1995-08-01), Papageorge et al.
patent: 5440171 (1995-08-01), Miyano et al.
patent: 5454160 (1995-10-01), Nickel
patent: 5455445 (1995-10-01), Kurtz et al.
patent: 5483101 (1996-01-01), Shimoto et al.
patent: 5490040 (1996-02-01), Gaudenzi et al.
patent: 5490324 (1996-02-01), Newman
patent: 5497397 (1996-03-01), Hershey et al.
patent: 5498767 (1996-03-01), Huddleston et al.
patent: 5502289 (1996-03-01), Takiar et al.
patent: 5506756 (1996-04-01), Haley
patent: 5521435 (1996-05-01), Mizukoshi
patent: 5523622 (1996-06-01), Harada et al.
patent: 5523662 (1996-06-01), Goldenberg et al.
patent: 5593927 (1997-01-01), Farnworth et al.
patent: 5604379 (1997-02-01), Mori
patent: 5643830 (1997-07-01), Rostoker et al.
patent: 5646828 (1997-07-01), Degani et al.
patent: 5677576 (1997-10-01), Akagawa
patent: 5683942 (1997-11-01), Kata et al.
patent: 5710071 (1998-01-01), Beddingfield et al.
patent: 5715144 (1998-02-01), Ameen et al.
patent: 5726489 (1998-03-01), Matsuda et al.
patent: 5736456 (1998-04-01), Akram
patent: 5741729 (1998-04-01), Selna
patent: 5759047 (1998-06-01), Brodsky et al.
patent: 5762744 (1998-06-01), Shibata et al.
patent: 5817986 (1998-10-01), Davidson et al.
patent: 5844304 (1998-12-01), Kata et al.
patent: 5851911 (1998-12-01), Farnworth
patent: 5872051 (1999-02-01), Fallon et al.
patent: 5950304 (1999-09-01), Khandros et al.
patent: 5973389 (1999-10-01), Culnane et al.
patent: 5973396 (1999-10-01), Farnworth
patent: 5984691 (1999-11-01), Brodsky et al.
patent: 5992012 (1999-11-01), Kirkman
patent: 5994766 (1999-11-01), Shenoy et al.
patent: 6011314 (2000-01-01), Leibovitz et al.
patent: 6018196 (2000-01-01), Noddin
patent: 6020220 (2000-02-01), Gilleo et al.
patent: 6025647 (2000-02-01), Shenoy et al.
patent: 6048753 (2000-04-01), Farnworth et al.
patent: 6122187 (2000-09-01), Ahn et al.
patent: 6133626 (2000-10-01), Hawke et al.
patent: 6147413 (2000-11-01), Farnworth
patent: 6165815 (2000-12-01), Ball
patent: 6166444 (2000-12-01), Hsuan et al.
patent: 6168969 (2001-01-01), Farnworth
patent: 6169329 (2001-01-01), Farnworth et al.
patent: 6175141 (2001-01-01), Hofbauer et al.
patent: 6181010 (2001-01-01), Nozawa
patent: 6198169 (2001-03-01), Kobayashi et al.
patent: 6204559 (2001-03-01), Lin et al.
patent: 6225143 (2001-05-01), Rao et al.
patent: 6225651 (2001-05-01), Billon
patent: 6232666 (2001-05-01), Corisis et al.
patent: 6242815 (2001-06-01), Hsu et al.
patent: 6255671 (2001-07-01), Bojarczuk, Jr. et al.
patent: 6261375 (2001-07-01), Siniaguine et al.
patent: 6278177 (2001-08-01), Ryu
patent: 6287893 (2001-09-01), Elenius et al.
patent: 6287976 (2001-09-01), Siniaguine et al.
patent: 6316839 (2001-11-01), Farnworth
patent: 6322903 (2001-11-01), Siniaguine et al.
patent: 6323134 (2001-11-01), Siniaguine
patent: 6329608 (2001-12-01), Rinne et al.
patent: 6340606 (2002-01-01), Hashimoto
patent: 6426562 (2002-07-01), Farnworth
patent: 6429096 (2002-08-01), Yanagida
patent: 6448661 (2002-09-01), Kim et al.
patent: 6518089 (2003-02-01), Coyle
patent: 6537482 (2003-03-01), Farnworth
patent: 6566232 (2003-05-01), Hara et al.
patent: 6746938 (2004-06-01), Uchiyama
patent: 6800930 (2004-10-01), Jackson et al.
patent: 6838377 (2005-01-01), Tonami et al.
patent: 6864172 (2005-03-01), Noma et al.
patent: 7022609 (2006-04-01), Yamamoto et al.
patent: 7112863 (2006-09-01), Imaoka
patent: 7180149 (2007-02-01), Yamamoto et al.
patent: 7232754 (2007-06-01), Kirby
patent: 7459729 (2008-12-01), Yang et al.
patent: 2002/0030245 (2002-03-01), Hanaoka et al.
patent: 2002/0113324 (2002-08-01), Cordes et al.
patent: 2004/0063268 (2004-04-01), Noma et al.
patent: 2005/0046002 (2005-03-01), Lee et al.
patent: 0486829 (1992-05-01), None
patent: 0622847 (1994-11-01), None
patent: 0660405 (1994-11-01), None
patent: 0684644 (1995-11-01), None
patent: 0692823 (1996-01-01), None
patent: 0704900 (1996-04-01), None
patent: 57085244 (1982-05-01), None
patent: 59229850 (1984-12-01), None
patent: 1023546 (1989-01-01), None
patent: 1061934 (1989-03-01), None
patent: 1132150 (1989-05-01), None
patent: 5036857 (1993-02-01), None
patent: 05129366 (1993-05-01), None
patent: 05275578 (1993-10-01), None
patent: 6077293 (1994-03-01), None
patent: 08330355 (1996-12-01), None
patent: 09320075 (1997-12-01), None
patent: 09321175 (1997-12-01), None
patent: 97/37374 (1997-10-01), None
One page of two overhead projections shown at a Semiconductor Industry Conference in San Diego, CA, AActivity Report of CSP Study Group@ and AChip Size Package,@ JWG#2-8, Jun. 1995.
Letter from Avi Ben-Har to Warren Farnworth, dated Mar. 27, 1996 (1 page), transmitting Zilber, G., et al., SlimcaseBA Thin Chip Size, Integrated Circuit Package (8 pages), to have been presented at ISHM-MCM Conference, Denver, CO Apr. 18, 1996.
Advertisement, ALaser Micromachining,@ MicroConnex Systems, 34935 SE Douglas Street, Snoqualmie, WA 98065, May 28, 2002.
Advertisement, ESI 5200 Drilling Station,@ MicroConnex Systems, 34935 SE Douglas Street, Snoqualmie, WA 98065, May 28, 2002.
Advertisement, ADamage Free Thinning,@ Tru-Si Technologies, 657 North Pastoria Ave., Sunnyvale, CA 94085, May 28, 2002.
Advertisement, AThrough-Silicon Vias,@ Tru-Si Technologies, 657 North Pastoria Ave., Sunnyvale, CA 94085, May 28, 2002.
Advertisement, ATE-2001-M,@ Tru-Si Technologies, 657 North Pastoria Ave., Sunnyvale, CA 94085, May 28, 2002.
Advertisement, ATE-2001-UT,@ Tru-Si Technologies, 657 North Pastoria Ave., Sunnyvale, CA 94085.
http://www.trusi.com/article9.htm, Savastiouk, Sergey, ANew Process Forms Die Interconnects by Vertical Wafer Stacking,@ pp. 1-2, ChipScale Review, May 28, 2002.
http://www.trusi.com/article7.htm, Savastiouk, Sergey, AMoore=s Law—the z dimension,@

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor devices and assemblies including back side... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor devices and assemblies including back side..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor devices and assemblies including back side... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2634701

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.