Substrate processing apparatus, method of manufacturing a...

Coating processes – Coating by vapor – gas – or smoke – Base includes an inorganic compound containing silicon or...

Reexamination Certificate

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C427S255370, C427S523000, C427S524000, C427S096700, C427S096800, C427S255260, C427S287000, C427S295000, C427S294000, C427S597000, C427S593000, C427S585000, C427S584000, C427S579000, C118S050000, C118S050100, C118S715000, C118S722000, C118S7230AN, C118S7230VE, C118S724000, C118S725000, C118S719000, C428S472000, C428S472100, C428S472200, C428S336000, C428S446000, C428S469000, C428S629000, C428S697000, C438S680000, C438S765000, C438S773000, C438S770000, C438S785000, C148S095000, C148S240000, C148S280000, C148S

Reexamination Certificate

active

07879400

ABSTRACT:
There is provided a substrate processing apparatus equipped with a metallic component, with at least a part of its metallic surface exposed to an inside of a processing chamber and subjected to baking treatment at a pressure less than atmospheric pressure. As a result of this baking treatment, a film which does not react with various types of reactive gases, and which can block the out diffusion of metals, is formed on the surface of the above-mentioned metallic component.

REFERENCES:
patent: 4100524 (1978-07-01), Kirsch
patent: 5259935 (1993-11-01), Davidson et al.
patent: 6805968 (2004-10-01), Saito et al.
patent: A-09-263931 (1997-10-01), None
patent: A-11-345772 (1999-12-01), None
patent: A-2003-041383 (2003-02-01), None
patent: 2003282553 (2003-10-01), None
patent: A-2003-282553 (2003-10-01), None
patent: A-2004-015975 (2004-01-01), None

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