Pattern prediction method, pattern correction method,...

Details Pattern prediction method, pattern correction method,... Pattern prediction method, pattern correction method,...

2011-03-08

2011-03-08

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000, C716S053000

Reexamination Certificate

active

07901853

ABSTRACT:
A pattern prediction method according to an embodiment includes: predicting a second pattern shape from a first pattern shape by using a conversion function and a conversion difference residual error amount function, wherein; the conversion function makes the connection between the first pattern formed by a first step and the second pattern formed by a second step following the first step based on contour shapes of the first pattern and the second pattern, and the conversion difference residual error amount function makes the connection between a residual error amount between a predicted shape of the second pattern obtained from the conversion function and the second pattern shape obtained by actually using the second step, and factors other than the contour shapes of the first pattern and the second pattern.

REFERENCES:
patent: 2008/0004852 (2008-01-01), Satake et al.
patent: 11-102062 (1999-04-01), None

Affiliated with

Also associated with

Rating

Pattern prediction method, pattern correction method,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern prediction method, pattern correction method,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern prediction method, pattern correction method,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2629930