Method and system for intelligent automated reticle managment

Details Method and system for intelligent automated reticle managment Method and system for intelligent automated reticle managment

2011-05-31

2011-05-31

DeCady, Albert (Department: 2121)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S121000

Reexamination Certificate

active

07953507

ABSTRACT:
A method, system, and program storage device for implementing the method of controlling a manufacturing system, wherein the method comprises providing a plurality of workpieces to be processed on a processing tool, the plurality of workpieces located at processing stations prior to the processing tool, determining auxiliary equipment allocation needs for the processing tool based on characteristics associated with the plurality of workpieces prior to the workpieces arriving at the processing tool, and sending auxiliary equipment to the processing tool based on the allocation needs prior to the workpieces arriving at the processing tool. According to an embodiment of the invention, the processing tool comprises a photolithographic system, the auxiliary equipment comprises a reticle, and the plurality of workpieces comprise semiconductor substrates.

REFERENCES:
patent: 4796194 (1989-01-01), Atherton
patent: 5740052 (1998-04-01), Nakamura
patent: 5841660 (1998-11-01), Robinson et al.
patent: 5972727 (1999-10-01), Ryan et al.
patent: 6457587 (2002-10-01), Conboy et al.
patent: 6517304 (2003-02-01), Matsumoto
patent: 6564113 (2003-05-01), Barto et al.
patent: 6594817 (2003-07-01), Federico et al.
patent: 6615098 (2003-09-01), Bode et al.
patent: 6640151 (2003-10-01), Somekh et al.
patent: 6930762 (2005-08-01), Yamada
patent: 7058627 (2006-06-01), Wiesler et al.
patent: 2002/0156548 (2002-10-01), Arackaparambil et al.
patent: 2004/0017556 (2004-01-01), Nakahara
patent: 2005/0090925 (2005-04-01), Albrecht et al.
patent: 2005/0216117 (2005-09-01), Lee et al.
Nadoli, et al., “Simulation in Automated Material Handling Systems Design for Semiconductor Manufacturing,” Proceedings of the 1994 Winter Simulation Conference, pp. 892-899.
Park, et al., “Assessment of Potential Gains in Productivity Due to Proactive Reticle Management Using Descrte Event Simulation,” Proceedings of the 1999 Winter Simulation conference, pp. 856-864.
Campbell, et al., “A Model of a 300MM Wafer Fabrication Line,” Proceedings of the 1999 Winter Simulation Conference, pp. 909-911.
Lee, et al., “Dispatching Heuristic for Wafer Fabrication,” Proceedings of the 2001 Winter Simulation Conference, pp. 1215-1219.
White, Jr., et al., “Operational Simulation of an X-Ray Lightography Cell: Comparison of 200 MM and 300 MM Wafers,” Proceedings of the 1999 Winter Simulation Conference, pp. 865-874.
Pierce, et al., “Modeling and Simulation of Material Handling for Semiconductor Wafter Fabrication,” Proceedings of the 1994 Winter Simulation Conference, pp. 900-906.
Robinson, et al., “Capacity Planning for Semiconductor Wafer Fabrication With Time Constraints Between Operations,” Proceedings of the 1999 Winter Simulation Conference, pp. 880-887.

Affiliated with

Also associated with

Rating

Method and system for intelligent automated reticle managment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for intelligent automated reticle managment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for intelligent automated reticle managment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2624307