Apparatus for cleansing semiconductor wafer

Details Apparatus for cleansing semiconductor wafer Apparatus for cleansing semiconductor wafer

1996-12-18

1998-09-01

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Having self cleaning means

1341044, 134902, 134155, 134186, 134109, 134201, B08B 304

Patent

active

057996784

ABSTRACT:
An improved apparatus for cleansing a semiconductor wafer which is capable of effectively removing the foreign substances from the wafer mounting grooves formed in the boats and the outer surface of the boat, for thus enhancing the reliability of the products. The apparatus includes an outer tub having a first cleansing liquid supply tube for supplying a cleansing liquid therethrough and a discharge tube for discharging the cleansing liquid therethrough, an inner tub disposed within the outer tub, a baffle plate disposed within the inner tub for distributing the cleansing liquid supplied to a wafer, a boat disposed on the baffle plate, on which boat a wafer is mounted, a foreign substance extraction tube disposed in a wafer support position of the boat for introducing the foreign substances formed in the interior of the inner tub thereinto and for discharging the same to the outside, and a second cleansing liquid supply tube for supplying the cleansing liquid to the foreign substance extraction tube.

REFERENCES:
patent: 4325394 (1982-04-01), Reams
patent: 4669612 (1987-06-01), Mortensen
patent: 5261431 (1993-11-01), Ueno et al.
patent: 5370142 (1994-12-01), Nishi et al.
patent: 5474616 (1995-12-01), Hayami et al.
patent: 5540247 (1996-07-01), Kawatani et al.
High Effective Rinse by Down Flow Bath System, Y. Hiratsuka et al., 24th Symposium On ULSI Ultra Clean Technology, Mar. 7-8, 1995, pp. 93-95.

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