Method and apparatus for enhancing illumination uniformity in wa

Photocopying – Projection printing and copying cameras – Step and repeat

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355 71, 355 80, G03B 2742

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active

050558714

ABSTRACT:
Enhanced uniformity of illumination is achieved in photolithography by interposing photochromic glass in the light path between the illuminator light source and a semiconductor wafer. In one embodiment of the invention, the photochromic glass is disposed immediately adjacent and before (upstream of) the mask. In another embodiment of the invention, the photochromic glass is disposed upstream of the mask, and an intermediate lens is disposed between the photochromic glass and the mask. In a still further embodiment of the invention, the photochromic glass is disposed in a reflector behind the illuminator light source. In other embodiments of the invention. The photochromic glass is disposed downstream of the mask. In yet another embodiment of the invention, the photochromic glass is exposed by two or more copies of a mask on a reticle to effect averaging. The photochromic glass is then used as a virtual mask to expose the wafer. Each of the described embodiments has its own advantages. Method and apparatus are disclosed.

REFERENCES:
patent: 2420636 (1947-05-01), Yule
patent: 3160504 (1964-12-01), Montani
patent: 3436353 (1969-04-01), Dreyer et al.
patent: 3441346 (1969-04-01), Naidich et al.
patent: 3598471 (1971-08-01), Baldwin et al.
patent: 3680956 (1972-08-01), Custer
patent: 3758207 (1973-09-01), Letzer
patent: 4025191 (1977-05-01), Seward

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