Plasma deposition of transparent conductive layers

Details Plasma deposition of transparent conductive layers Plasma deposition of transparent conductive layers

1977-12-01

1979-02-20

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427164, 427166, B05D 306

Patent

active

041408144

ABSTRACT:
A transparent conductive layer of SnO.sub.2 is deposited on a substrate by an RF-plasma assisted chemical vapor reaction of CO.sub.2 with an organic tin compound, such as tetramethyl tin, for example. A CCD optical imager is fabricated, using the method of the invention to form a transparent conductive layer thereon.

REFERENCES:
patent: 3243363 (1966-03-01), Helwig
patent: 3808035 (1974-04-01), Stelter
patent: 3991228 (1976-11-01), Carlson et al.

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