Method of measuring impurities in oxide films using a meltable s

Details Method of measuring impurities in oxide films using a meltable s Method of measuring impurities in oxide films using a meltable s

1989-04-17

1991-10-08

Lacey, David L.

Chemistry: analytical and immunological testing

Including sample preparation

Liberation or purification of sample or separation of...

436177, 436174, G01N 100, G01N 134

Patent

active

050554131

ABSTRACT:
An object to be measured is moved relative to a stick prepared by cooling and solidifying a solution into a rod-like shape. The stick is brought into contact with the surface of the object to be measured, thereby dissolving a natural oxide film and the like formed on the surface of the object. After the stick is brought into contact with the overall surface of the object to be measured, the solution held at the end portion of the stick is analyzed by chemical analysis to measure the type and amount of an impurity adhered on the surface of the object.

REFERENCES:
patent: 4144760 (1979-03-01), Schlueter et al.
patent: 4584886 (1986-04-01), Matsunaga et al.
patent: 4634497 (1987-01-01), Shimazaki
patent: 4990459 (1991-02-01), Maeda et al.
Japanese Journal of Applied Physics--Supplements, 16th (1984 International) Conference on Solid State Devices and Materials, Kobe, 1984; "Chemical Analysis of Ultratrace Impurities in SiO.sub.2 Films", Shimazaki et al., pp. 281-284.
Ramirez-Munoz, J., Atomic-Absorption Spectrocopy and Analysis by Atomic-Absorption Flame Photometry, Elsevier Publishing Co., 1968, pp. 11-14.

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